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Fully Automatic Polisher
TFP-2320 INDEX
This equipment is configured with 3 polishing stations and 8 polishing heads, featuring high processing efficiency. It is equipped with a polishing plate cooling and temperature monitoring system to ensure constant temperature during the polishing process. The automatic loading and unloading of wafers are realized through cassettes and manipulators, supporting a fully automatic dry-in wet-out processing mode. Compatible with different types of polishing liquids, it is suitable for polishing various semiconductor materials.
  • Polishing Plate Specifications

    OD630 mm

  • Polishing Plate Specifications

    3

  • Number of Polishing Heads

    4 groups of 8 polishing heads

  • Features
    Pressurizing method
    Airbag pressurization , accurate pressure control
    Wafer moisturizing
    Lifting-type water immersion cassette for moisturizing wafers and preventing dry mark
    Automatic system
    Dry - in and wet - out full , automatic mode processing
    Abundant configurations
    4 groups of 8 polishing heads and 3 polishing disks